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¡¡ ¡¡  Products > Laser Optics > High Energy/Power Partially Reflecting Laser Mirrors

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Specifications

Substrate Material

UV Grade Fused Silica or BK7

Surface Figure

¦Ë/10 typical at 633nm

Transmitted Wavefront

¦Ë/10 typical at 633nm

Surface Quality

10/5 laser quality

Diameter Tolerance

+0.0mm~-0.25mm

Thickness Tolerance

¡À0.25mm

Wedge

¡Ü5 minutes

Chamfer

0.25mm at 45¡ã typical

Concentricity

¡Ü0.05mm

Radius Tolerance

¡À0.5%

Coating Technology

Electron Beam Evaporation, Dielectric Mulitlayers

Adhesion and Durability

Per MIL-C-675A. Insoluble in lab solvents

Clear Aperture

>85% of dimensions

Angle of Incidence

0¡ã

Laser Induced Damage Threshold

10J/cm2, 1064nm, 1 ns pulse

Wavelength available for the high energy partially reflecting laser mirrors. (nm)

248, 266, 308, 337, 355, 364, 488, 515, 527, 532, 589, 633, 670, 694, 755, 780, 800, 830, 850, 940, 1047, 1053, 1064, 1235, 1319, 1550, 2010, 2100

Reflectance (%)

10¡À3.0, 20¡À4.0, 30¡À5.0, 40¡À5.0, 50¡À5.0, 60¡À4.0, 70¡À4.0, 75¡À4.0, 80¡À3.0, 90¡À2.0, 95¡À1.5, 98¡À1.0, 99¡À0.5

Substrate Diameter(mm)

10, 12.7, 15, 20, 25, 25.4, 30

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